Two-dimensional atomic lithography by sub-micron focusing of atomic beams

摘要

We analyze a method for serial writing of arbitrary two-dimensional patternsusing optical focusing of a collimated atomic beam. A spatial light modulatoris used in a side illumination geometry to create a localized optical spot withsecondary maxima that are well separated from the central peak. Numericalsimulation of a lithography experiment using a magneto-optical trap as a sourceof cold Cs atoms, collimation and cooling in a magnetic guide, and opticalfocusing predicts full width at half maximum pixel sizes of 110 x 110 nm andwriting times of about $20 \rm ms$ per pixel.